relation: http://miis.maths.ox.ac.uk/miis/23/
title: Modelling of plasmas used for etching semiconductors
creator: Budd, C.J.
creator: Richardson, G.
subject: None/Other
date: 2003-04
type: Study Group Report
type: NonPeerReviewed
format: application/pdf
language: en
identifier: http://miis.maths.ox.ac.uk/miis/23/1/PlasmaEtching.pdf
identifier:   Budd, C.J. and Richardson, G.  (2003) Modelling of plasmas used for etching semiconductors.  [Study Group Report]